The JEOL JSM-6500F is a Field Emission Scanning Electron Microscope (FESEM) w/Electron Beam Lithography attachment, and Nanometer Pattern Generation Systems (NPGS). It offers high resolution images of ...
(Nanowerk News) Integrated optical signal distributing, processing, and sensing networks require the miniaturization of basic optical elements, such as waveguides, splitters, gratings, and optical ...
(Nanowerk Spotlight) Lithography is a key technology for the production of semiconductor devices. It is used to define nanoscale patterns on computer chips. Electron beam lithography (EBL) is a type ...
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